Top chip leaders urge national drive to ‘build China’s ASML’ amid US curbs
Top Chinese semiconductor executives are advocating for a national initiative to develop a domestic alternative to ASML, the Dutch company dominating extreme ultraviolet (EUV) lithography technology. This call to action, published in the Chinese journal Science and Technology Review, comes in response to US sanctions hindering China's progress in chip manufacturing.

Briefing Summary
AI-generatedTop Chinese semiconductor executives are advocating for a national initiative to develop a domestic alternative to ASML, the Dutch company dominating extreme ultraviolet (EUV) lithography technology. This call to action, published in the Chinese journal Science and Technology Review, comes in response to US sanctions hindering China's progress in chip manufacturing. The executives, representing SMIC, Empyrean, YMTC, and Naura Technology, argue that the current Chinese industry is too fragmented and weak to overcome these restrictions. They highlight US control over electronic design automation (EDA), silicon wafers, and manufacturing equipment, particularly EUV lithography, as key obstacles. The article emphasizes the complexity of EUV machines, noting their reliance on thousands of global suppliers, to underscore the need for a comprehensive, coordinated national effort.
Article analysis
Model · rule-basedKey claims
5 extractedASML has been barred from exporting EUV machines to China.
The current industry was too “small, fragmented and weak”, which was “dispersing numerous public resources”.
China’s top semiconductor executives have called for a nationwide push to build a domestic alternative to Dutch chip-equipment giant ASML.
An ASML EUV machine contains over 100,000 components sourced from 5,000 suppliers.
The US had contained China’s rise in three main areas: EDA, silicon wafers, and manufacturing equipment, especially EUV lithography technology.